SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

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United States of America Patent

APP PUB NO 20150263020A1
SERIAL NO

14611866

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Abstract

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A semiconductor device is provided. The semiconductor device includes a semiconductor substrate and an electrostatic discharge (ESD) protection device disposed on the semiconductor substrate. The ESD protection device includes a source and a drain disposed in the semiconductor substrate, a gate disposed on the semiconductor substrate between the source and the drain, and a p-type doped region disposed in the drain.

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Patent Owner(s)

Patent OwnerAddress
SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) CORPORATIONSHANGHAI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
GUO, Bing Shanghai, CN 18 55
GUO, Zhiguang Shanghai, CN 8 24
JIN, Fengji Shanghai, CN 1 0
LI, Hongwei Shanghai, CN 138 980
WANG, Xiaoyuan Shanghai, CN 58 89
ZHOU, Chuanmiao Shanghai, CN 2 1

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