WET WIPE CHEMICAL SOLUTION AND WET WIPE

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United States of America Patent

APP PUB NO 20150265523A1
SERIAL NO

14430529

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A chemical solution for wet wipe and a wet wipe that are paraben-free and allow ease of extraction thereof even with higher water content than conventional products. A paraben-free chemical solution for wet wipe is provided in which the product of the chemical solution film thickness measured by a measurement method specified below and the chemical solution surface tension is at least 810 um·mN/m. For measuring the chemical solution film thickness, first, 0.03 ml of the chemical solution was dropped on a glass slide and another glass slide of the same size was gently placed thereon. Then, allow the glass slides to stand for 30 seconds, and measure the liquid film thickness of the chemical solution interposed between the glass slides by magnified observation with a microscope from a position immediately lateral to the glass slides.

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Patent Owner(s)

Patent OwnerAddress
UNICHARM CORPORATIONEHIME 799-0111

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bandoh, Takeshi Kagawa, JP 12 170
Kondoh, Nami Kagawa, JP 1 1
Ueda, Takahiro Kagawa, JP 81 658

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