Gas processing apparatus

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United States of America Patent

PATENT NO 9468698
APP PUB NO 20150265740A1
SERIAL NO

14633745

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Abstract

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A gas processing apparatus of an embodiment includes: first and second dielectric substrates facing with each other; first and second discharge electrodes respectively disposed on a pair of facing principal surfaces of the dielectric substrates; first and second ground electrodes respectively disposed on a pair of principle surfaces at opposite sides of the principle surfaces of the dielectric substrates; a gas flow path to supply gas to be processed between the discharge electrodes; an AC power source to generate first and second plasma-induced flows by applying an AC voltage between the discharge electrodes and the ground electrodes; and a region disposed between the dielectric substrates at downstream of the plasma-induced flows from the discharge electrodes, and a gap between the dielectric substrates being 1.3 times or less of a sum of thicknesses of the plasma-induced flows.

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Patent Owner(s)

  • KABUSHIKI KAISHA TOSHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akita, Masato Kanagawa, JP 43 170
Sanada, Yasushi Kanagawa, JP 12 166
Sato, Yosuke Kanagawa, JP 162 1317
Ui, Akio Tokyo, JP 34 834

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