SUBSTRATE PROCESSING APPARATUS AND RESIST REMOVING UNIT
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United States of America Patent
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Sep 24, 2015
app pub date -
Mar 23, 2015
filing date -
Mar 24, 2014
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Abstract
A substrate processing apparatus capable of inhibiting diffusion of a chemical solution atmosphere around a processing bath. The substrate processing apparatus has a processing bath for storing a substrate holder holding a substrate and for processing the substrate, a lifter configured to support the substrate holder, store the substrate holder in the processing bath, and take out the substrate holder from the processing bath, and a cover configured to cover the periphery of the substrate holder taken out from the processing bath by the lifter.
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