HETEROSTRUCTURE FIELD EFFECT TRANSISTOR HAVING HIGH EFFICIENCY AND METHOD OF PREPARING THE SAME

United States of America Patent

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Issued Date
Sep 24, 2015
app pub date
Mar 3, 2015
filing date
Mar 4, 2014

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Abandoned

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Abstract

A high-efficiency heterojunction filed effect transistor in which a gate electrode area is formed to the direction of a drain electrode on nitride-based buffer layers with a low dislocation density to exhibit a high breakdown voltage, and its preparation method.

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Patent Owner(s)

Patent Owner	Address
INDUSTRIAL COOPERATION FOUNDATION OF CHONBUK NATIONAL UNIVERSITY	JEONJU-SI JEOLLABUK-DO 54896

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H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
JEON, DaeWoo	Jeollabuk-do, KR	1	1
LEE, InHwan	Jeollabuk-do, KR	11	16

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HETEROSTRUCTURE FIELD EFFECT TRANSISTOR HAVING HIGH EFFICIENCY AND METHOD OF PREPARING THE SAME

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14636714

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14636714

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