Systems and Methods to Control Sources of Atomic Species in a Deposition Process
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
N/A
Issued Date -
Oct 8, 2015
app pub date -
Apr 7, 2014
filing date -
Apr 7, 2014
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
Systems and methods as well as components and techniques can exhibit stable and accurate control of a deposition process by monitoring background-corrected deposition rates of an atomic species via atomic absorption (AA) spectroscopy. The systems and methods have high sensitivity and resolution in addition to extremely effective background correction and baseline drift removal, achieved in part by basing the background correction and baseline drift removal on analysis of resonant and non-resonant AA lines. The systems and methods can result in surprisingly short warm-up times and can drastically reduce the noise coming from the instruments and the surrounding environment.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully