SOLVENT RESISTANT POLYMERIC MEMBRANES

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United States of America Patent

SERIAL NO

14386909

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Abstract

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A radiation curable composition for preparing a polymeric membrane includes a) a membrane polymer selected from the group consisting of a polysulfone (PSU), a polyether sulfone (PES), a polyether etherketone (PEEK), a polyvinylchloride (PVC), a polyacrylonitrile (PAN), a polyvinylidene fluoride (PVDF), a polyimide (PI), a polyamide (PA) and copolymers thereof; b) a hydrophobic monomer or oligomer having at least two free radical polymerizable groups independently selected from the group consisting of an acrylate group, a methacrylate group, an acrylamide group, a methacrylamide group, a styrene group, a vinyl ether group, a vinyl ester group, a maleate group, a fumarate group, an itaconate group, and a maleimide group; and c) an organic solvent for the membrane polymer and the hydrophobic monomer. A polymeric membrane and a method for manufacturing the membrane are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
AGFA-GEVAERT2640 MORTSEL
KATHOLIEKE UNIVERSITEIT LEUVEN3000 LEUVEN

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
LOCCUFIER, Johan Mortsel, BE 292 1503
STRUZYNSKA-PIRON, Izabela Mortsel, BE 2 0
VANKELECOM, Ivo Mortsel, BE 13 35
VANMAELE, Luc Mortsel, BE 86 1224

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