Importance

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Abstract

A pattern forming method of the present invention includes (a) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains (A) to (C) below,

(A) a resin where polarity increases due to an action of acid and solubility decreases with respect to a developer which includes an organic solvent,(B) a compound which generates acid when irradiated with actinic rays or radiation, and(C) a compound which has a cation site and an anion site in the same molecule and where the cation site and the anion site are linked with each other by a covalent bond,(b) exposing the film, and(c) forming a negative tone pattern by developing the exposed film using a developer which includes an organic solvent.

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First Claim