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Abstract

A method of patterning an unpatterned transparent conductive film, the unpatterned transparent conductive film comprising: a transparent substrate, a first conductive layer disposed on a first surface of the transparent substrate, and a second conductive layer disposed on a second surface of the transparent substrate, the first and second surfaces being disposed on two opposing sides of the unpatterned transparent conductive film, the first conductive layer comprising a first set of metal nanostructures, and the second conductive layer comprising a second set of metal nanostructures, the method comprising irradiating the first conductive layer with at least one first laser to form a patterned transparent conductive film, where the irradiation of the first conductive layer patterns the first conductive layer with a first pattern without also patterning the second conductive layer with the first pattern, and also where the unpatterned transparent conductive film and the patterned transparent conductive film both exhibit total visible light transmissions of at least about 90%.

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First Claim