ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED Ti3+ METAL IONS AS REDUCING AGENTS

United States of America Patent

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Issued Date
Oct 29, 2015
app pub date
Apr 29, 2014
filing date
Apr 29, 2014

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Abandoned

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Abstract

A solution for electroless deposition of nickel is provided. A reducing agent of Ti³⁺ ion is provided to the solution. Ni²⁺ ions are provided to the solution.

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Patent Owner	Address
LAM RESEARCH CORPORATION	4650 CUSHING PARKWAY FREMONT CA 94538

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C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
DORDI, Yezdi	Palo Alto, US	117	2663
JAGMINIENE, Aldona	Vilnius, LT	11	74
JOI, Aniruddha	Fremont, US	19	17
NORKUS, Eugenijus	Vilnius, LT	14	83
STANKEVICIENE, Ina	Vilnius, LT	9	24
TAMASAUSKAITE-TAMASIUNAITE, Loreta	Vilnius, LT	4	7

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ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED Ti3+ METAL IONS AS REDUCING AGENTS

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14264997

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14264997

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