Low volume showerhead with porous baffle

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United States of America Patent

PATENT NO 10741365
APP PUB NO 20150315706A1
SERIAL NO

14668511

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A low volume showerhead in a semiconductor processing apparatus can include a porous baffle to improve the flow uniformity and purge time during atomic layer deposition. The showerhead can include a plenum volume, one or more gas inlets in fluid communication with the plenum volume, a faceplate including a plurality of first through-holes for distributing gas onto a substrate in the semiconductor processing apparatus, and a porous baffle positioned in a region between the plenum volume and the one or more gas inlets. The one or more gas inlets can include a stem having a small volume to improve purge time. The baffle can be porous and positioned between the stem and the plenum volume to improve flow uniformity and avoid jetting.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PARKWAY FREMONT CA 94538

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chandrasekharan, Ramesh Portland, US 72 3944
Kang, Hu Tualatin, US 59 7174
LaVoie, Adrien Newberg, US 182 14781
Pasquale, Frank L Tualatin, US 24 1634
Sangplung, Saangrut Sherwood, US 9 425
Swaminathan, Shankar Beaverton, US 105 10204

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