Plasma dry strip pretreatment to enhance ion implanted resist removal

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United States of America Patent

PATENT NO 9740104
SERIAL NO

14268455

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Systems and methods for processing a substrate include exposing a substrate to UV light from a UV light source having a predetermined wavelength range. The substrate includes a photoresist layer that has been bombarded with ions. The method includes controlling a temperature of the substrate, while exposing the substrate to the UV light, to a temperature less than or equal to a first temperature. The method includes removing the photoresist layer using plasma while maintaining a temperature of the substrate to less than or equal to a strip process temperature after exposing the substrate to the UV light.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Berry,, III Ivan L San Jose, US 32 1228
Gilchrist, Glen Danvers, US 10 18

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