PATTERNED FILMS AND METHODS
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United States of America Patent
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Issued Date -
Nov 12, 2015
app pub date -
Apr 7, 2015
filing date -
May 9, 2014
priority date (Note) -
Abandoned
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Abstract
A method for patterning a film, the film comprising conductive nanostructures dispersed in a matrix, the matrix comprising at least one first leachable compound, the method comprising leaching at least some of the at least one first leachable compound from the matrix to form at least one patterned region of the matrix, the at least one patterned region comprising at least some of the conductive nanostructures, where the film prior to leaching exhibits a first surface resistivity, a first total light transmittance, and a first percent haze, and the at least one patterned region exhibits a second surface resistivity that is less than the first surface resistivity.
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