POLYETHYLENE-BASED STRUCTURE

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United States of America Patent

APP PUB NO 20150329712A1
SERIAL NO

14655372

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Abstract

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A polyethylene-based structure of the present invention is a polyethylene-based structure composed of a resin composition containing 60 to 90% by mass of a polyethylene (A), 5 to 35% by mass of an acid-modified polyethylene (B), and 5 to 35% by mass of a m-xylylene group-containing polyamide (C), wherein the m-xylylene group-containing polyamide (C) is dispersed in the form of layers in the resin composition which constitutes the structure, and the acid value of the acid-modified polyethylene (B) is from 5 to 30 mg/g.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI GAS CHEMICAL COMPANY INC5-2 MARUNOUCHI 2-CHOME CHIYODA-KU TOKYO 100-8324

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ishii, Kentaro Kanagawa, JP 43 177
Katou, Tomonori Kanagawa, JP 9 17
Kobayashi, Hiroshi Kanagawa, JP 892 9321
Kouno, Kenji Kanagawa, JP 64 1081

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