Photocured composition, blocking layer comprising same and encapsulated device comprising same

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United States of America Patent

PATENT NO 10829577
APP PUB NO 20150337065A1
SERIAL NO

14758670

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Abstract

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The present invention relates to a photocured composition comprising (A) a photocurable monomer and (B) a monomer of chemical formula 1, a blocking layer comprising the same, and an encapsulated device comprising the same.

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Patent Owner(s)

  • CHEIL INDUSTRIES INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Choi, Seung Jib Uiwang-si, KR 17 78
Kwon, Ji Hye Uiwang-si, KR 17 103
Lee, Chang Min Uiwang-si, KR 55 142
Lee, Ji Yeon Uiwang-si, KR 61 328
Lee, Yeon Soo Uiwang-si, KR 33 93
Nam, Seong Ryong Uiwang-si, KR 24 81

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