Salt, acid generator, photoresist composition and process of producing photoresist pattern

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United States of America Patent

PATENT NO 10359700
APP PUB NO 20150338735A1
SERIAL NO

14714812

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Abstract

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A salt represented by formula (I):

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Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anryu, Yukako Osaka, JP 23 87
Ichikawa, Koji Osaka, JP 299 1929
Yamamoto, Satoshi Osaka, JP 491 4088

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