Importance

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Abstract

A focus ring replacement method for a plasma reactor, and associated systems and methods are disclosed herein. In one embodiment, a plasma processing system includes a plasma reactor and a wafer handler. The plasma reactor includes a processing chamber defining an enclosure and having a chamber opening accessible to the enclosure. A wafer holder assembly is positioned within the enclosure and configured to hold a semiconductor wafer and a focus ring that surrounds the semiconductor wafer. The wafer handler is configured to transport the focus ring through the chamber opening, and the wafer holder assembly is further configured to transfer the focus ring between the wafer handler and the wafer holder assembly.

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First Claim