METHOD FOR PRODUCING NITRIDE CRYSTAL

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United States of America Patent

APP PUB NO 20150354086A1
SERIAL NO

14831551

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Abstract

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A method for producing a nitride crystal, comprising growing a nitride crystal on the surface of a seed crystal put in a reactor while the temperature and the pressure inside the reactor that contains, as put thereinto, a seed crystal having a hexagonal-system crystal structure, a nitrogen-containing solvent, a starting material, and a mineralizing agent containing fluorine and at least one halogen element selected from chlorine, bromine and iodine are so controlled that the solvent therein could be in a supercritical state and/or a subcritical state to thereby grow a nitride crystal on the surface of the seed crystal in the reactor.

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATION1-1 MARUNOUCHI 1-CHOME CHIYODA-KU TOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
FUJISAWA, Hideo Ushiku, JP 33 124
KAMADA, Kazunori Ushiku, JP 22 109
MlKAWA, Yutaka Ushiku, JP 2 1

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