FABRICATION OF BINARY MASKS WITH ISOLATED FEATURES

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United States of America Patent

APP PUB NO 20150355538A1
SERIAL NO

14760394

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An environmentally benign method for producing binary microfabrication masks is disclosed. An optical target may be provided that includes a water-soluble polymer material in contact with an ultraviolet radiation transmittable substrate. A laser may be focused on a primary mask to produce a mask image, the mask image thereafter being reduced by demagnification optics to provide a reduced image. The optical target may be exposed to the reduced image to create features of reduced size from the primary mask. The water-soluble polymer exposed to the ultraviolet radiation may be ablated from the optical target. The optical target may be subsequently metalized using a metal vapor to coat the remaining polymer material and exposed substrate. The metalized optical target may be contacted with an aqueous fluid to remove the metalized polymer material leaving the binary mask.

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Patent Owner(s)

Patent OwnerAddress
INDIAN INSTITUTE OF TECHNOLOGY KANPURDEAN RESEARCH & DEVELOPMENT ROOM NUMBER 151 FACULTY BUILDING POST OFFICE IIT KANPUR KANPUR UTTAR PRADESH 208016

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
RAMKUMAR, Janakarajan Kanpur, Uttar Pradesh, IN 5 8
SINGH, Govind Dayal Kanpur, Uttar Pradesh, IN 4 9
SUBRAMANIAM, ANANTHA Ramakrishna Kanpur, Uttar Pradesh, IN 3 1

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