METHODS FOR CLEANING SEMICONDUCTOR SUBSTRATES

United States of America Patent

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Issued Date
Dec 10, 2015
app pub date
Jun 9, 2015
filing date
Jun 10, 2014

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Abandoned

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Abstract

Methods for cleaning semiconductor substrates with cleaning baths including ammonium hydroxide, hydrogen peroxide and a non-ionic surfactant are disclosed. The methods may result in reduced re-adhesion of released particles during cleaning which produces cleaner substrates.

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Patent Owner(s)

Patent Owner	Address
SUNEDISON SEMICONDUCTOR LIMITED (UEN201334164H)	9 BATTERY ROAD #15-01 STRAITS TRADING BUILDING SINGAPORE 049910

International Classification(s)

H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....

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[Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Capstick, James R	Florissant, US	3	27
Kweskin, Sasha Joseph	St. Louis, US	11	337
Ragan, Tracy M	Warrenton, US	6	50
Short, Lara	O'Fallon, US	1	1

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METHODS FOR CLEANING SEMICONDUCTOR SUBSTRATES

Number of patents in Portfolio can not be more than 2000

United States of America Patent

14734693

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14734693

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