METHOD OF PRODUCING A REVEALABLE INVISIBLE PATTERN IN A TRANSPARENT CONDUCTIVE FILM
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United States of America Patent
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Issued Date -
Dec 17, 2015
app pub date -
May 14, 2015
filing date -
Jun 11, 2014
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Abstract
A transparent conductive film comprising at least one patterned region comprising a first concentration of at least one radiation absorbing compound and exhibiting a first surface resistivity, at least one unpatterned region comprising a second concentration of the at least one radiation absorbing compound and exhibiting a second surface resistivity, the second concentration being different from the first concentration and the second surface resistivity being different from the first surface resistivity, where the at least one patterned region and the at least one unpatterned region are indistinguishable from each other to the unaided human eye, and where the at least one radiation absorbing compound is capable of rendering the at least one patterned region and at least one unpatterned region distinguishable from each other to the unaided human eye when the at least one radiation absorbing compound is exposed to radiation within a defined band of wavelengths.
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