SHADOW MASKS AND METHODS FOR THEIR PREPARATION AND USE

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United States of America Patent

APP PUB NO 20150367452A1
SERIAL NO

14737409

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Abstract

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A method of forming a shadow mask is provided. The method includes annealing at least one polymeric sheet to form at least one annealed polymeric sheet. The method also includes transferring a pattern from a primary mask to the annealed polymeric sheet using laser micromachining to form the shadow mask.

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Patent Owner(s)

Patent OwnerAddress
INDIAN INSTITUTE OF TECHNOLOGY KANPURDEAN RESEARCH & DEVELOPMENT ROOM NUMBER 151 FACULTY BUILDING POST OFFICE IIT KANPUR KANPUR UTTAR PRADESH 208016

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Singh, Govind Dayal Allahabad, IN 4 9
Subramaniam, Anantha Ramakrishna Kanpur, IN 3 1

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