APPARATUS FOR PROCESSING SUBSTRATE
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United States of America Patent
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Issued Date -
Dec 31, 2015
app pub date -
Feb 17, 2014
filing date -
Mar 27, 2013
priority date (Note) -
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Abstract
Provided is a substrate processing apparatus. The substrate processing apparatus includes a process chamber having an inner space in which a substrate transferred from the outside is accommodated, and a process with respect to the substrate is performed, hot-wire heaters disposed in a sidewall of the process chamber, the hot-wire heaters being disposed around the inner space to heat the substrate, and a cooling tube in which a refrigerant supplied from the outside flows, the cooling tube being disposed between the hot-wire heaters along the sidewall of the process chamber.
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