Cleaning Gas and Cleaning Method
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United States of America Patent
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Issued Date -
Jan 7, 2016
app pub date -
Jan 24, 2014
filing date -
Feb 14, 2013
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Abstract
A cleaning gas according to the present invention is intended for removing a silicon carbide-containing deposit on a base of at least partially graphitized carbon and is characterized by containing iodine heptafluoride. It is possible by the use of such a cleaning gas to remove silicon carbide without etching of graphite.
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