Method of manufacturing substrate and substrate and mask film

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United States of America Patent

PATENT NO 9857687
SERIAL NO

14770979

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Importance

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Abstract

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A method of manufacturing a substrate includes applying solder resist ink containing a mixing resin of epoxy-based resin and acrylic-based resin on at least one surface of a substrate body to form a solder resist layer, and irradiating a predetermined portion of the solder resist layer with ultraviolet rays and controlling an amount of irradiation of the ultraviolet rays irradiated to the predetermined of the solder resist layer to form the predetermined portion in transmissivity that transmits light.

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Patent Owner(s)

  • YAMATOYA & CO., LTD;TOKAI SHINEI ELECTRONICS INDUSTRY CO., LTD.;TOKAI SHINEI ELECTRONICS INIDUSTRY CO., LTD

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akiyama, Koji Ena, JP 107 1632
Inoue, Akira Tokyo, JP 485 5463
Kato, Takehiro Ena, JP 23 120
Murakami, Masaru Ena, JP 37 631
Nishio, Kazuyoshi Ena, JP 1 0
Numakura, Iwao Tokyo, JP 17 173
Saito, Tadayoshi Yokohama, JP 15 886
Tanaka, Kiyoshi Ena, JP 88 1335
Tanaka, Yoshihito Ena, JP 16 128
Tsuge, Kazunori Ena, JP 53 1041
Tsukada, Noriaki Tokyo, JP 7 125
Yoshimura, Hirotoshi Tokyo, JP 1 0

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