Method for fabricating a semiconductor device for use in an optical application
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United States of America Patent
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Oct 4, 2016
Grant Date -
Jan 21, 2016
app pub date -
Sep 28, 2015
filing date -
Jan 28, 2014
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Abstract
A semiconductor device for use in an optical application and a method for fabricating the device. The device includes: an optically passive aspect that is operable in a substantially optically passive mode; and an optically active material having a material that is operable in a substantially optically active mode, wherein the optically passive aspect is patterned to include a photonic structure with a predefined structure, and the optically active material is formed in the predefined structure so as to be substantially self-aligned in a lateral plane with the optically passive aspect.
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