Mask processing apparatus and mask processing method

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United States of America Patent

PATENT NO 9632407
APP PUB NO 20160018730A1
SERIAL NO

14483805

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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According to an embodiment, a mask processing apparatus is provided. The mask processing apparatus includes a stage, a laser light source and a rotary mechanism. The stage is configured to hold a mask formed with a pattern to be transferred to a transfer target substrate. The laser light source is configured to output laser light that is radiated into the mask and thereby alters the mask. The rotary mechanism is configured to rotate the stage in an in-plane direction of a pattern formation surface of the mask.

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Patent Owner(s)

  • TOSHIBA MEMORY CORPORATION;KABUSHIKI KAISHA YOSHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Komine, Nobuhiro Nagoya, JP 42 97
Kuriyama, Taketo Yokkaichi, JP 5 17
Sato, Hidenori Yokohama, JP 111 1095
Takakuwa, Manabu Tsu, JP 34 111

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