EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
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United States of America Patent
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Jan 21, 2016
app pub date -
Jan 26, 2015
filing date -
Jul 15, 2014
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Abstract
According to one embodiment, an exposure method is disclosed. The method includes irradiating a first light and a second light on a mask including a plurality of light transmitting portions arranged in a periodic pattern. The first light has a peak of intensity at a first wavelength. The second light has a peak of intensity at a second wavelength. The first wavelength is shorter than a distance between the mask and a substrate disposed to be separated from the mask. The second wavelength is longer than the first wavelength. The method includes irradiating a first interference light transmitted through the light transmitting portions and a second interference light transmitted through the light transmitting portions on the substrate.
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