Method of Measuring Overlay Error and a Device Manufacturing Method
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United States of America Patent
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Issued Date -
Jan 21, 2016
app pub date -
Sep 28, 2015
filing date -
Aug 19, 2008
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
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