Liquid composition and etching method for etching silicon substrate

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United States of America Patent

PATENT NO 9799526
SERIAL NO

14798024

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Abstract

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An etching method includes etching a silicon substrate with a liquid composition containing an alkaline organic compound, water, and a boron compound with a content in the range of 1% by mass to 14% by mass. The boron compound is at least one of boron sesquioxide, sodium tetraborate, metaboric acid, sodium perborate, sodium borohydride, zinc borate, and ammonium borate.

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Patent Owner(s)

  • CANON KABUSHIKI KAISHA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Fujita, Hirohisa Saitama, JP 9 21
Koyama, Shuji Kawasaki, JP 91 1037
Yonemoto, Taichi Isehara, JP 30 100

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