Applications for nanopillar structures

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United States of America Patent

PATENT NO 9716141
APP PUB NO 20160020278A1
SERIAL NO

14595851

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A disclosed method of fabricating a hybrid nanopillar device includes forming a mask on a substrate and a layer of nanoclusters on the hard mask. The hard mask is then etched to transfer a pattern formed by the first layer of nanoclusters into a first region of the hard mask. A second nanocluster layer is formed on the substrate. A second region of the hard mask overlying a second region of the substrate is etched to create a second pattern in the hard mask. The substrate is then etched through the hard mask to form a first set of nanopillars in the first region of the substrate and a second set of nanopillars in the second region of the substrate. By varying the nanocluster deposition steps between the first and second layers of nanoclusters, the first and second sets of nanopillars will exhibit different characteristics.

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Patent Owner(s)

  • NXP USA, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hall, Mark D Austin, US 186 2039
Shroff, Mehul D Austin, US 114 1282

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