POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON GROOVE PATTERN

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United States of America Patent

SERIAL NO

14875513

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Polishing pads with concentric or approximately concentric polygon groove patterns are described. Methods of fabricating polishing pads with concentric or approximately concentric polygon groove patterns are also described.

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Patent Owner(s)

Patent OwnerAddress
CMC MATERIALS INC870 NORTH COMMONS DRIVE AURORA IL 60504

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Allison, William C Beaverton, US 49 610
Scott, Diane Portland, US 50 817
Simpson, Alexander William Hillsboro, US 16 192

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