OZONE GENERATOR AND OZONE GENERATION METHOD
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United States of America Patent
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Issued Date -
Jan 28, 2016
app pub date -
Nov 11, 2013
filing date -
Nov 9, 2012
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Abstract
In order to generate ozone, which is used for ashing and plasma cleaning, plasma generated in a decompressed chamber is conventionally used. But it is difficult to reduce the production cost of an ozone generation, because facility cost and process cost are expensive in a decompressed process. According to the present invention, ozone is generated by atmospheric pressure plasma CVD using dielectric barrier discharge generated by a plasma head where a plurality of plasma head unit members are installed in parallel to generate plasma by applying electric field or magnetic field via a dielectric member. Stable glow discharge plasma is formed even under atmospheric pressure by dielectric barrier discharge. Then, ozone can be generated under atmospheric pressure, and semiconductor device with low cost can be fabricated.
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