ISOTHERMAL PLASMA CVD SYSTEM FOR REDUCED TAPER IN OPTICAL FIBER PREFORMS
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United States of America Patent
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Jan 28, 2016
app pub date -
Jul 24, 2014
filing date -
Jul 24, 2014
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Abstract
A chemical vapor deposition (CVD) system is configured to reduce the presence of geometrical and optical taper at the end sections of the preform, or more generally controlling the axial profile of the fabricated optical fiber preform. The system is configured to create an isothermal plasma within the substrate tube, with a relatively confined deposition zone located upstream of the plasma. A reagent delivery system is configured to adjust the composition and concentration of the introduced species in sync with the movement of the plasma and deposition zone within the substrate tube. By synchronizing the movement of the plasma with the adjustable reagent delivery system, it is possible to provide precision control of the axial profile of the created optical fiber preform.
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