Method for generating pattern, storage medium, and information processing apparatus
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United States of America Patent
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Nov 7, 2017
Issued Date -
Jan 28, 2016
app pub date -
Jul 17, 2015
filing date -
Jul 22, 2014
priority date (Note) -
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Abstract
A method for generating a pattern includes defining a footprint of a main pattern in each cell, arranging a first cell and a second cell which has an auxiliary pattern outside the footprint of the main pattern, side by side in such a manner that the auxiliary pattern outside the footprint of the second cell is present in the footprint of the main pattern of the first cell, and generating the pattern of the mask by removing a pattern element of the auxiliary pattern outside the footprint of the second cell in a portion where the pattern element of the auxiliary pattern outside the footprint of the second cell is close to or overlaps with the main pattern in the first cell of the first cell and the second cell arranged side by side.
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