Processing apparatus, processing method, and manufacturing method of electronic device

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 10242861
APP PUB NO 20160035595A1
SERIAL NO

14800926

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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According to one embodiment, a processing apparatus includes a first supply section, a second supply section, a gas supply section, and a sublimation section. The first supply section supplies a first fluid on surfaces of a plurality of workpieces. The second supply section supplies a fluid containing a sublimable material on the surfaces of the plurality of workpieces to which the first fluid is supplied. The gas supply section supplies gas on the surfaces of the plurality of workpieces to which a fluid containing the sublimable material is supplied. The sublimation section sublimates a layer containing the sublimable material formed on each surface of the plurality of workpieces. The gas supply section controls a thickness of the layer containing the sublimable material formed each surface of the plurality of workpieces by controlling a flow velocity of the gas in each surface of the plurality of workpieces.

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Patent Owner(s)

  • KABUSHIKI KAISHA TOSHIBA

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirabayashi, Hideaki Yokohama, JP 48 572
Sato, Katsuhiro Yokkaichi, JP 153 915

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