Lithography Cluster, Method and Control Unit for Automatic Rework of Exposed Substrates
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United States of America Patent
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Issued Date -
Feb 11, 2016
app pub date -
Mar 18, 2014
filing date -
Apr 30, 2013
priority date (Note) -
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Abstract
A lithography cluster comprises a track unit, a lithography apparatus, a metrology unit, a control unit and a strip unit. The track unit is for applying a layer on a substrate for lithographic exposure. The lithography apparatus is for exposing the layer according to a pattern. The metrology unit is for measuring a property of the exposed pattern in the layer. The control unit is for controlling an automatic substrate flow between the track unit, the lithography apparatus, and the metrology unit. The strip unit is for removing the layer from the substrate. The control unit is constructed and arranged for controlling the automatic substrate flow on the basis of the measured property such that the substrate is directed to the strip unit for removing the layer if a measured property of its pattern falls outside a pre-determined quality range.
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