METHOD AND APPARATUS FOR REMOVING EXPERIMENTAL ARTIFACTS FROM ENSEMBLE IMAGES
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United States of America Patent
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Issued Date -
Feb 25, 2016
app pub date -
Aug 14, 2015
filing date -
Aug 25, 2014
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Abstract
A method and apparatus wherein a photoluminescence in a semiconductor wafer is excited using an ultraviolet light source. A plurality of partial raw images of the photoluminescence is generated. The plurality of partial raw images includes at least one equipment-generated artifact The at least one equipment-generated artifact is removed from the cluster of partial raw images using the equipment-generated artifact image to generate a cluster of partial processed images. A plurality of clusters of partial processed images is generated. The plurality of clusters of partial processed images are aligned and combined to generate a wafer image tree of the at least one equipment-generated artifact.
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