COMPOSITION AND METHOD FOR POLISHING A SAPPHIRE SURFACE
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United States of America Patent
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Issued Date -
Mar 3, 2016
app pub date -
Aug 28, 2015
filing date -
Aug 29, 2014
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Abstract
An improved composition and method for polishing a sapphire surface is disclosed. The method comprises abrading a sapphire surface, such as a C-plane, R-plane or A-plane surface of a sapphire wafer, with a polishing composition comprising colloidal silica suspended in an aqueous medium, the polishing composition having an acidic pH and including a sapphire removal rate-enhancing amount of phosphoric acid.
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