METHOD FOR FABRICATING CRYSTALLINE PHOTOVOLTAIC CELLS
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United States of America Patent
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Issued Date -
Mar 10, 2016
app pub date -
Aug 28, 2015
filing date -
Sep 4, 2014
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Abstract
A method for fabricating a crystalline semiconductor photovoltaic cell is disclosed. In one aspect, the method includes depositing a dielectric layer at first predetermined locations on a surface of a semiconductor substrate. The method further includes growing a doped epitaxial layer at second predetermined locations on a surface of the semiconductor substrate, the second predetermined locations being different from and non-overlapping with the first predetermined locations. The method further includes maintaining the dielectric layer as a surface passivation layer in the photovoltaic cell. The method also includes forming an emitter region, a back surface field region or a front surface field region of the photovoltaic cell from the doped epitaxial layer.
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