Halogen Resistant Amides, Polyamides, and Membranes Made From the Same

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United States of America Patent

SERIAL NO

14857679

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Abstract

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A halogen resistant polyamide is formed from the reaction product of an amine monomer and an acid chloride monomer wherein the amino group of the starting amine monomer is separated from the aromatic amine ring system by an alkyl group and (i) minimizes halogenation on the amine and (ii) minimizes N-halogenation at a pH range of approximately 7 to approximately 10.5. A membrane is made from the polyamide for use, for example, in a reverse osmosis desalination unit.

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Patent Owner(s)

Patent OwnerAddress
THE GOVERNMENT OF THE UNITED STATES AS REPRESENTED BY THE SECRETARY OF THE INTERIOR1849 C STREET NW WASHINGTON DISTRICT OF COLUMBIA 20240

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Murphy, Andrew P Littleton, US 14 106
Porras, Mendoza Yuliana E Arvada, US 2 1
Riley, Robert L La Jolla, US 13 343

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