Resin, resist composition and method for producing resist pattern

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9519218
APP PUB NO 20160077430A1
SERIAL NO

14854881

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Abstract

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1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator.

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Patent Owner(s)

  • SUMITOMO CHEMICAL COMPANY, LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ichikawa, Koji Osaka, JP 298 1929
Nishimura, Takashi Osaka, JP 253 2501
Shimada, Masahiko Osaka, JP 79 445

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