Polishing pad, polishing apparatus and method for manufacturing polishing pad

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United States of America Patent

PATENT NO 10022836
APP PUB NO 20160082568A1
SERIAL NO

14848147

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Abstract

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The present invention relates to a polishing pad comprising a base sheet containing a restriction layer. The invention also relates to a polishing apparatus and a method for manufacturing a polishing pad.

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Patent Owner(s)

Patent OwnerAddress
SAN FANG CHEMICAL INDUSTRY CO LTDKAOHSIUNG CITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Feng, Chung-Chih Kaohsiung, TW 112 308
Hung, Yung-Chang Kaohsiung, TW 45 119
Liu, Wei-Te Kaohsiung, TW 10 28
Wang, Chun-Ta Kaohsiung, TW 13 25
Yao, I-Peng Kaohsiung, TW 79 189

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