SUBSTRATE PROCESSING APPARATUS
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United States of America Patent
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N/A
Issued Date -
Mar 24, 2016
app pub date -
Sep 1, 2015
filing date -
Sep 24, 2014
priority date (Note) -
Abandoned
status (Latency Note)
Importance
Abstract
A substrate processing apparatus includes a process chamber configured to process a substrate; a shower head installed at an upstream side of the process chamber; a gas supply pipe connected to the shower head; a first exhaust pipe connected to a downstream side of the process chamber; a second exhaust pipe connected to a second wall surface, which is different from a first wall surface adjacent to the process chamber, in wall surfaces forming the shower head; a pressure detecting part installed in the second exhaust pipe; and a control part configured to control each of the process chamber, the shower head, the gas supply pipe, the first exhaust pipe, the second exhaust pipe, and the pressure detecting part.
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