Substrate Processing Apparatus, Gas Introduction Shaft and Gas Supply Plate
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United States of America Patent
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Issued Date -
Mar 24, 2016
app pub date -
Aug 14, 2015
filing date -
Sep 24, 2014
priority date (Note) -
Abandoned
status (Latency Note)
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Abstract
Provided is a substrate processing apparatus including: a substrate support unit; a gas supply plate including a plurality of gas distribution pipes connected to a plurality of gas supply regions; and a gas introduction shaft mounted on the gas supply plate. The gas introduction shaft includes a plurality of gas introduction pipes. Each of the plurality of gas introduction pipes is connected to each of the plurality of gas distribution pipes via each of a plurality of gas discharging spaces having an annular shape.
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