MEMS Chip and Manufacturing Method Thereof

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United States of America Patent

SERIAL NO

14966562

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Abstract

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A MEMS chip includes a cap layer and a composite device layer. The cap layer includes a substrate. The substrate has a first region and a second region, wherein the first region includes plural first trenches and the second region has plural second trenches. The first region has a first etch pattern density and the second region has a second etch pattern density, wherein the first etch pattern density is higher than the second etch pattern density to form chambers of different pressures.

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Patent Owner(s)

Patent OwnerAddress
RICHTEK TECHNOLOGY CORPORATION14F-1 NO 8 TAIYUEN 1ST ST ZHUBEI CITY HSINCHU COUNTY 30288

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kang, Yu-Fu Taipei, TW 14 29
Lo, Chiung-Cheng Zhunan Township, TW 13 35

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