Ag alloy film for reflecting electrode or wiring electrode, reflecting electrode or wiring electrode, and Ag alloy sputtering target
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United States of America Patent
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Apr 17, 2018
Issued Date -
N/A
app pub date -
Jun 11, 2014
filing date -
Jun 26, 2013
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An Ag alloy film used for a reflecting electrode or an interconnection electrode, the Ag alloy film exhibiting low electrical resistivity and high reflectivity and having exceptional oxidation resistance under cleaning treatments such as an O2 plasma treatment or UV irradiation, wherein the Ag alloy film contains either In in an amount of larger than 2.0 atomic % to 2.7 atomic % or smaller; or Zn in an amount of larger than 2.0 atomic % to 3.5 atomic % or smaller; or both. The Ag alloy film may further contain Bi in an amount of 0.01 to 1.0 atomic %.
First Claim
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International Classification(s)
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
- H01B:CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATER....
- C22F:CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS MET....
- B32B:LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA....
- C22C:ALLOYS
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