Systems and Methods for Wet Processing Substrates with Rotating Splash Shield
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United States of America Patent
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Issued Date -
Apr 21, 2016
app pub date -
Oct 21, 2014
filing date -
Oct 21, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
Embodiments provided herein provide systems and methods for wet processing substrates with a rotating splash shield. The systems include a fluid dispenser configured to dispense a processing fluid. A substrate support configured to support and rotate a substrate is also included. The substrate support is disposed such that the processing fluid dispensed by the fluid dispenser flows onto the substrate. A splash shield is positioned on at least one side of the substrate support and is configured to rotate. The splash shield has an upper portion extending above an upper surface of the substrate and a lower portion extending below a lower surface of the substrate.
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