GAS SUPPLY APPARATUS
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United States of America Patent
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Issued Date -
Apr 28, 2016
app pub date -
May 8, 2014
filing date -
May 8, 2013
priority date (Note) -
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Abstract
The present invention relates to a gas supply device and, more specifically, to a gas supply device which can improve the flow of process gas within a process chamber and can increase a degree of uniformity of a deposition layer. The gas supply device, according to the present invention, comprises: a lead having a gas pipe connected thereto; a first plate for discharging, to a process chamber, gas introduced into the lead; a second plate provided so as to disperse gas flowing towards the bottom by being arranged between the lead and the first plate; a plurality of discharge holes on the first plate; and a plurality of discharge holes formed on the second plate, wherein a discharge hole formed at a corner section of the second plate is arranged in a different state from that of a discharge hole of a corner section formed at the same position on the first plate.
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