LITHOGRAPHY APPARATUS, LITHOGRAPHY METHOD, AND ARTICLE MANUFACTURING METHOD
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United States of America Patent
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Issued Date -
May 5, 2016
app pub date -
Oct 26, 2015
filing date -
Oct 30, 2014
priority date (Note) -
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Abstract
At least one lithography apparatus, lithography method and method of manufacturing an article are provided herein. At least one lithography apparatus for performing patterning on a substrate, includes a stage configured to hold the substrate and be movable, an irradiation device configured to irradiate the substrate with a beam for the patterning, and a controller configured to cause the stage and the irradiation device to perform a first process of forming, on a substrate including a zeroth mark for overlay inspection, a first mark for overlay inspection to be paired with the zeroth mark and a second mark for overlay inspection, with the patterning not being performed, and to perform a second process of forming, on the substrate, a third mark for overlay inspection to be paired with the second mark, with the patterning being performed.
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